China develops its own EUV lithography machines: Challenging ASML's position.

Create MindDecember 18, 2025 09:21

China has successfully developed its first EUV lithography prototype, a significant step forward in the semiconductor race. However, the device is not yet complete and mass production is not expected until 2028.

China has achieved a significant milestone in its semiconductor industry with the successful development of its first prototype extreme ultraviolet (EUV) lithography machine. This achievement, which involved former ASML employees, is seen as a breakthrough in breaking its dependence on foreign technology. However, the device is not yet fully operational, and mass production is projected to begin no earlier than 2028.

Trung Quốc đã giải mã kỹ thuật thành công một máy quang khắc EUV (nguồn ảnh: ASML)
China has successfully deciphered the technology of an EUV lithography machine (image source: ASML).

Decoding EUV Photolithography Technology

EUV lithography is the core and most complex process in modern semiconductor chip manufacturing. It uses ultra-short wavelength light (ultraviolet light) to "print" microscopic integrated circuits onto silicon wafers. Mastering this technology allows manufacturers to create chips with higher performance, smaller size, and lower power consumption, which are fundamental to all advanced electronic devices, from smartphones to data centers.

Currently, the Dutch company ASML holds a global monopoly on the production and supply of EUV lithography machines. Each of these systems is a marvel of engineering, containing hundreds of thousands of components and valued at hundreds of millions of dollars, making it a strategic bottleneck in the global semiconductor supply chain.

Progress and challenges ahead

China's successful decoding and fabrication of a prototype EUV machine marks a significant leap forward in building a self-reliant semiconductor ecosystem. However, the path from prototype to commercial production remains fraught with challenges. Sources indicate that the current device is incomplete, suggesting that technical challenges related to light sources, optics, and vacuum environments still need to be addressed.

The fine-tuning process to achieve high accuracy and yield rates in mass production requires years of research and testing. The projected timeline of 2028 to 2030 accurately reflects the complexity of this technology. Future success will depend not only on perfecting the machine but also on building a domestic supply chain for supporting components.

Impact on the global semiconductor industry

In the long term, if China succeeds in mass-producing chips using its own EUV (Extra-High Voltage) technology, it could reshape the global semiconductor landscape. It would reduce the country's reliance on Western technology and potentially break ASML's monopoly. However, until then, the global semiconductor industry will continue to operate based on existing supply chains, with ASML playing an irreplaceable central role in the highest-end process chip segment.

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China develops its own EUV lithography machines: Challenging ASML's position.
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